FABRICATION OF MO NANORODS ON SILICON WAFER USING GLANCING ANGLE DEPOSITION TECHNIQUE

Authors

Abstract
Array of silicon nanorods with a circular cross section onto Mo nanopillars arrangement were grown using glancing angle deposition (GLAD) on Si (100).Deposition technique was used to fabricate Mo thin film on silicon flat surface. Teflon deposited on the tips of Mo nanorods at normal incident evaporation (θdep.is 0oC) with deposition time of (5 min.) to study the hydrophoposity and hydroplilicity of the surface. Morphology of Mo and Mo/Teflon nanocomposite was carried out using scanning electron microscope (SEM) which indicates a (100 nm) of mo thin film and Mo nanorods on silicon substrate. Contact angle measurement on nanocomposite Mo nanorods with Teflon grown on their tips exhibited contact angle values as high as (116o) indicating an increase in the hydrophopocity of original hydrophilic Mo nanostructures that had an angle of (40o).

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Volume 6, Issue 2
Spring 2013
Pages 139-147

  • Receive Date 01 June 2013
  • Revise Date 20 June 2013
  • Accept Date 25 June 2013