Copper oxide (CuO) thin films were prepared by cold spray process using inert atmosphere (helium gas) without employing any catalyst. CuO dry powder was sprayed onto microscope glass slide by heating carrier gas at 100, 200, 300, and 400 °C ,with 30 bar gas pressure onto substrates of 300 ± 5°C at different angles 0°, 30°, 45°, then study the effect of these parameter on the structural, and optical properties of the resulted thin film. The X-ray diffraction (XRD) studies showed that the as-deposited CuO has the monoclinic structure with low strain. SEM images show that the thin film has no porosity or agglomeration and deposit on the entire region. The CuO thin film exhibited a high transmittance of about (96%)